高电子迁移率晶体管
电子工程
光电子学
氮化镓
材料科学
逻辑门
宽禁带半导体
计算机科学
电气工程
电压
晶体管
工程类
纳米技术
图层(电子)
作者
Ji Shu,Jiahui Sun,Xinke Wu,Kevin J. Chen
标识
DOI:10.1109/tpel.2024.3520671
摘要
The gate terminal of mainstream Schottky-type p-GaN gate high-electron-mobility transistor (HEMT) is particularly vulnerable to the gate voltage ringing during the fast-switching transient due to its narrow gate voltage headroom for safe operation. In this work, a new gate driver circuit with expanded gate voltage headroom and suppressed gate-loop oscillation/ringing is proposed. The new design is based on a dynamic two-stage turn-on process enabled by a GaN lateral field-effect rectifier (L-FER)-resistor pair that can self-adaptively adjust the gate charging speed according to the real-time gate voltage, enabling fast charging during the initial turn-on stage and slow charging when the gate is near complete turn on. The latter stage effectively suppresses the gate-loop oscillation to enable an elevated gate turn-on voltage for a stronger yet safe gate overdrive to suppress the dynamic RON degradation in the GaN HEMT. Such a dynamic two-stage gate voltage profile can be realized without additional active sensing or control. The GaN L-FER is implemented with a low-voltage GaN HEMT in the diode mode that is free of reverse recovery issues. Equipped with this dynamic two-stage gate driver, the fast-switching potential of the GaN HEMT can be fully unlocked to reduce the switching loss without gate overstress; meanwhile, the switching oscillation can also be suppressed significantly.
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