光致发光
材料科学
重组
退火(玻璃)
晶体缺陷
外延
光电子学
碳化硅
位错
基质(水族馆)
硅
自发辐射
表征(材料科学)
红外线的
结晶学
黑硅
无辐射复合
分子物理学
载流子寿命
辐射传输
光学
基面
宽禁带半导体
平面
凝聚态物理
作者
Hongyu Peng,Yuhan Gao,Tianyu Shu,田广通,Can Zhu,Chao Gao
摘要
In recent years, photoluminescence (PL) black features in 4H‐SiC recorded by a surface inspection tool have plagued substrate suppliers, epitaxy and device manufacturers, as both their root causes and adverse effects remain unclear. This study shows that PL blacks correspond to threading dislocations (TDs) and basal plane dislocations (BPDs). Substrates exhibiting different PL black characteristics are found to present distinct peak profiles in their PL spectra, indicating differences in point defect‐related recombination processes. The elimination of PL black features following annealing is attributed to the increased formation of radiative recombination centers in the long‐wavelength spectral range, particularly in regions surrounding dislocations. These results establish a link between point defects and PL images, facilitating more effective characterization and investigation of point defects in silicon carbide substrates.
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