材料科学
光电子学
辐射硬化
冶金
高电子迁移率晶体管
压痕硬度
辐射
焊接
场效应晶体管
复合材料
作者
Xuan Xie,Minze Wang,Ziang Wang,Zhi Wang,Yawen Zhang,Qiuyi Tang,C. Chu,Guangwei Xu,Shibing Long,Bo Shen,Shu Yang
标识
DOI:10.1109/ispsd64561.2026.11553987
摘要
In this work, a 450 V/18 mΩ radiation hardened p-GaN gate HEMT with gate-junction termination extension (G-JTE) structure has been demonstrated. The multi-finger G-JTE HEMT exhibits an enhanced single-event burnout (SEB) voltage of 475 V with a relatively short LGDof 6.5 μm under Ta ion irradiation with a high LET of 82 MeV•cm2/mg, while maintaining a low on-resistance (RON) of 18.3 mΩ (or RON,spof 1.64 mΩ•cm2) and low RON•QGof 252 mΩ•nC. By virtue of the G-JTE to suppress the electric field concentration and consequently reduce the non-equilibrium carriers, the G-JTE HEMT can deliver a ${\text{BFO}}{{\text{M}}_{{\text{SEB}}}}\,\left( {{V_{{\text{SEB}}}}^2/{R_{{\text{ON}},{\text{sp}}}}} \right)$ of 138 MW/cm2, which is the highest among the state-of-the-art GaN HEMTs. This work demonstrates great potential of p-GaN gate HEMTs for high-frequency and high-efficiency power converters in aerospace applications.
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