晶体管
场效应晶体管
渗透(认知心理学)
材料科学
二硫化钼
钼
可变距离跳频
电子能带结构
过渡金属
凝聚态物理
逻辑门
电子工程
电压
光电子学
物理
电气工程
化学
电阻率和电导率
工程类
催化作用
神经科学
生物
冶金
生物化学
作者
Lingfei Wang,Yang Li,Xiao Gong,Aaron Thean,Gengchiau Liang
标识
DOI:10.1109/led.2018.2820142
摘要
Due to structural disorder effects, variable range hopping (VRH) transport via band-tail states has been widely observed in the transition-metal dichalcogenide field-effect transistor (TMD FET). However, this significant mechanism has not been incorporated into existing compact models. In this letter, a continuous physics-based compact model considering VRH in TMD FET is developed. Key parameters are extracted by calibration to experimental molybdenum disulfide FET. The voltage dependent carrier density and temperature dependent current characteristics are physically predicted by utilizing the general percolation theory and generalized Einstein relation. Our model is validated by the good agreement between the simulation and experimental results. Furthermore, the relationship between the disorder effects and circuit-level performances are presented. This letter is significant for material engineering and device optimization of TMD FET.
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