Key Technology for Fabrication of 5000line/mm Gratings Mask by Using E-beam Lithography

For fabricating X-ray mask of high line-density X-ray transmission gratings,the field stitching of E-beam lithography was analyzed when patterning high line-density gratings;by using pattern correction and low sensitive 950 k PMMA resist,the proximity effect of electron beam was effectively depressed when exposing thick resist spun on polyimide membrane.Finally,the mask of 5 000 line/mm gratings with line width of 100 nm～110 nm and period of 200 nm for X-ray lithography was successfully fabricated by e-beam lithography and micro-electroplating.