Preparation Technologies of LPCVD Silicon Nitride Films

Silicon nitride (Si_3N_4)films are widely used in the fields of semiconductor,microelectronics and MEMS with their excellent advantages.This paper introduced the preparation technologies and properties of CVD for Si_3N_4 films and the process of low pressure chemical vapor deposition(LPCVD).The thickness uniformity of films has been demonstrated on a batch LPCVD furnace platform by adjusting the process temperature.