The characterization of diamond single crystal growing along (100) after annealing treatment under high pressure and high temperature

退火(玻璃) 钻石 材料科学 光致发光 分析化学(期刊) 金刚石材料性能 氮气 谱线 傅里叶变换红外光谱 Crystal(编程语言) 矿物学 结晶学 化学 化学工程 光电子学 冶金 色谱法 有机化学 物理 工程类 天文 程序设计语言 计算机科学
作者
Xiaozhou Chen,Fuming Deng,Xiaomeng Bing,Ziyi Liu,Xiaotian Xing,Wenli Deng,Xiang Yu,Donglin Cao,Sheng Zhang,Yiqian Feng,Yan Wang
出处
期刊:International Journal of Refractory Metals & Hard Materials [Elsevier BV]
卷期号:121: 106678-106678 被引量:6
标识
DOI:10.1016/j.ijrmhm.2024.106678
摘要

Diamond has many desirable properties. In this study, temperature gradient method was used to prepare a series of type Ib diamond single crystals, which were processed again to obtain and characterize Type IaA diamonds with even more desirable properties. Before annealing, Fourier-transformed infra-red(FTIR) spectra of diamond showed peaks at 1130 cm−1 and 1344 cm−1; After annealing, the peak at 1282 cm−1 was appeared in FTIR spectra of diamonds This data indicated that the isolated nitrogen in diamond aggregated after high-pressure and high-temperature (HPHT) method annealing experiment. Moreover, photoluminescence (PL) spectra suggested that no nitrogen-related color centers existed in the diamond before annealing. In contrast, after annealing, a peak at 637 nm appeared in the PL spectra, indicating the appearance of NV−colors centers type Ib diamond post-annealing. The experimental results show that type Ib diamond crystals can be decolorized after 60 min of annealing under 7 GPa and 1850 °C, which makes part of the area transparent. Under 7 GPa and 2100 °C, type Ib diamond crystals can produce NV color center when annealed for 3 min. With increasing annealing temperature and prolonged annealing duration, the density and size of etch pits on the crystal surface escalated. Therefore, this study provides a guideline for the decolorization of diamonds by HPHT annealing. Moreover, this study also reports a method to change the crystal type and obtain NV color centers under ultra-high-temperature annealing conditions of 7 GPa pressure and 2100 °C temperature, which can be applied to develop quantum materials.
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