thin films deposited by stoichiometric target sputtering

Thin films of (NBCO) were fabricated on MgO (100) substrates by dc magnetron sputtering. The critical parameters for the deposition of the superconducting NBCO thin films were studied. The properties of films strongly depended on the substrate temperature and sputtering gas pressures. The x-ray diffraction pattern showed that the sputter-deposited thin films were highly c -axis oriented. Thin films with could be obtained reproducibly under the optimized sputtering conditions. This film also showed a critical current density of about at 77 K.