Lv3
308 积分 2025-10-21 加入
Role of physisorption in atomic layer etching of silicon nitride
58分钟前
待确认
Mass spectrometric studies of plasma etching of silicon nitride
5天前
已完结
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
11天前
已完结
Influence of different etching mechanisms on the angular dependence of silicon nitride etching
11天前
已完结
Quantitative chemical topography of polycrystalline Si anisotropically etched in Cl2/O2 high density plasmas
13天前
已完结
Anomalous semiconductorlike transport induced by the Curie transition in a C o 51 V 31 G a 18 metamagnetic Heusler alloy
27天前
已完结
Local magnetic structure in fully and partially ordered V 2 X Al Heusler alloys ( X = Cr, Mn, Fe, Co, Ni)
30天前
已完结
Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation
1个月前
已完结
Observation of inverse magnetocaloric effect in magnetic-field-induced austenite phase of Heusler alloys Ni50−xCoxMn31.5Ga18.5 (x=9 and 9.7)
2个月前
已完结
Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
3个月前
已完结
In-depth analysis of the steady operation of SAD (Simultaneous Anammox and Denitrification) process with added recirculation
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