氧化铟锡
工作职能
电子亲和性(数据页)
X射线光电子能谱
铟
紫外线
氧化物
锡
氧气
化学
分析化学(期刊)
等离子体
无机化学
电极
材料科学
光化学
化学工程
光电子学
物理化学
有机化学
工程类
物理
分子
量子力学
作者
Delia J. Milliron,Ian G. Hill,Chongfei Shen,Antoine Kahn,Jeffrey Schwartz
摘要
Oxygen plasma treatment of indium tin oxide (ITO) results in a change in work function and electron affinity by ∼0.5 eV. This change correlates with the measured increase in injected current in simple “hole-only” organic devices with O-plasma treated ITO electrodes. Neither addition nor removal of surface hydroxyl functionality accounts for the observed work function and electron affinity changes. X-ray and ultraviolet photoelectron spectroscopies show a new type of oxygen species is formed. Oxidation of surface Sn-OH to surface Sn-O• units is proposed to account for the observed changes in O-plasma treated ITO; this proposal can explain a wide variety of previously described ITO surface activation results.
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