方波
材料科学
电压
铝
局部放电
基质(水族馆)
硅酮
陶瓷
涂层
分析化学(期刊)
复合材料
金属化
光电子学
金属
电气工程
化学
冶金
色谱法
工程类
地质学
海洋学
作者
Ivan Semenov,Ingrid Folkestad Gunheim,Kaveh Niayesh,Hans Kristian Meyer,L.E. Lundgaard
标识
DOI:10.1109/tdei.2022.3163812
摘要
The objective of this article is to characterize partial discharge (PD) inception voltages and patterns at sinusoidal and square voltages in insulating ceramic substrates with generic manufacturing defects. PD tests were conducted on active metal brazed (AMB) aluminum nitride (AlN) substrates either with cavities in the polymer coating or sharp protrusions of the metal brazing. The substrates were tested in silicone liquid instead of silicone gel. Light sensitive imaging was used to localize the PD sites on the surface. PDs at square voltage with rise time of $1.6 ~\mu \text{s}$ were measured with a high-frequency current transformer and a photomultiplier. In both substrate types, the peak–peak value of the PD inception voltage (PDIV) was higher at sinusoidal voltage compared to peak-peak value of the square wave. This difference was more pronounced in uncoated substrates, where discharges incepted at sharp edges surrounded by silicone liquid. For both types of defects, comparable PDIVs were measured at bipolar and unipolar square waves. Results for unipolar pulses are discussed considering the role of charge memory effect.
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