材料科学
激光阈值
光电子学
光致发光
法布里-珀罗干涉仪
飞秒
光学
激光器
波长
物理
作者
Zhiyuan Yu,Zhihe Guo,Yu-Chen Zhang,Xun Zhang,Yan Wang,Fengyang Ma,Yu Liu,Xia-Yan Xue,Qingyuan Jin,Jing Li,Jian Sun,Songyou Wang,Dong-Chen Wang,Ming‐Yen Lu
标识
DOI:10.1016/j.rinp.2022.105336
摘要
A luminescent Si nanocrystal (SiNC) thin film with photoluminescence quantum yield (PLQY) > 70% was made by using hydrogen silsesquioxane (HSQ), followed by long-time high-pressure hydrogenation. A net optical gain of 524 ± 21 cm−1 was obtained by means of variable stripe length-shifting excitation spot (VSL-SES). A rectangularly shaped SiO2 Fabry-Perot (F-P) cavity with size of 1.5 μm (width) × 0.7 μm (height) × 2000 μm (length) was made on top of the SiNC thin film. The waveguide F-P device was pumped with a 400 nm femtosecond pulsed laser. A threshold behavior of the light emission intensity as a function of the pumping power was observed. Other lasing characteristics including spectral narrowing, polarization of the emission, and small emission angle were also observed beyond the threshold pumping power.
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