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Photodegradation of polychlorinated biphenyls in water/nitrogen-doped silica and air/nitrogen-doped silica systems: Kinetics, mechanism and quantitative structure activity relationship (QSAR) analysis

光降解 动力学 数量结构-活动关系 环境化学 化学 取代基 反应速率常数 光化学 有机化学 光催化 催化作用 立体化学 量子力学 物理
作者
Wenqian Cao,Nannan Wu,Shengnan Zhang,Yumeng Qi,Ruixue Guo,Zunyao Wang,Ruijuan Qu
出处
期刊:Science of The Total Environment [Elsevier BV]
卷期号:924: 171586-171586 被引量:7
标识
DOI:10.1016/j.scitotenv.2024.171586
摘要

Developing efficient and low-cost photocatalytic materials is essential for removing polychlorinated biphenyls (PCBs). In this work, the photodegradation process of fourteen representative polychlorinated biphenyls (PCBs) in both water/nitrogen-doped SiO2 (N-SiO2) and air/N-SiO2 systems was studied. The photodegradation kinetics of PCBs is consistent with the pseudo-first-order kinetic equation. The variation in the degradation effects of different PCBs in the two systems is primarily related to the position of the Cl substituent and the effective absorption wavelength range of PCBs. A total of fourteen intermediates for 4′-Dichlorobiphenyl (PCB-15), 2,2′,4,4′,6,6′-Hexachlorobiphenyl (PCB-155), and 2,2′,3,3′,4,4′,5,5′,6,6′-Decachlorobiphenyl (PCB-209) generated from four reaction pathways were identified based on both mass spectrometry analysis and theoretical calculations. Using the values of lnk (k denotes pseudo-first-order kinetic constants) for the 11 PCBs in the training set and the calculated molecular and structural parameters, quantitative structure-activity relationship (QSAR) models for the two systems were constructed by using multiple linear regression (MLR) method to better understand the factors affecting the photodegradation rate of PCBs. The QSAR equations were obtained with Cl atom substitution at position 3 (N3) as the main parameter, which were lnk = −1.98 - 0.19 N3 for the water/N-SiO2 system and lnk = −1.56 - 0.34 N3 for the air/N-SiO2 system, with the correlation coefficient (R2) of 0.66 and 0.73, leave-one-out cross-validation (Q2LOO) of 0.51 and 0.59, respectively, and bootstrapping validation coefficients (Q2BOOT) values of both 0.74, confirming that the models were well fitted and showed high robustness and prediction ability. This study provides valuable insights into photocatalytic degradation studies of PCBs.
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