氧气
材料科学
二氧化二钒
过渡金属
氧气输送
薄膜
金属-绝缘体过渡
钒
电阻率和电导率
离子键合
电化学
金属
纳米技术
化学物理
离子
化学
电极
催化作用
物理化学
冶金
有机化学
工程类
电气工程
生物化学
作者
Hyeji Sim,Kyung‐Yeon Doh,Yunkyu Park,Kyung Song,Gi‐Yeop Kim,Junwoo Son,Donghwa Lee,Si‐Young Choi
出处
期刊:Small
[Wiley]
日期:2024-07-10
卷期号:20 (43): e2402260-e2402260
被引量:8
标识
DOI:10.1002/smll.202402260
摘要
Abstract The metal–insulator (MI) transition of vanadium dioxide (VO 2 ) is effectively modulated by oxygen vacancies, which decrease the transition temperature and insulating resistance. Oxygen vacancies in thin films can be driven by oxygen transport using electrochemical potential. This study delves into the role of crystallographic channels in VO 2 in facilitating oxygen transport and the subsequent tuning of electrical properties. A model system is designed with two types of VO 2 thin films: (100)‐ and (001)‐oriented, where channels align parallel and perpendicular to the surface, respectively. Growing an oxygen‐deficient TiO 2 layer on these VO 2 films prompted oxygen transport from VO 2 to TiO 2 . Notably, in (001)‐VO 2 film, where oxygen ions move along the open channels, the oxygen migration deepens the depleted region beyond that in (100)‐VO 2 , leading to more pronounced changes in metal‐insulator transition behaviors. The findings emphasize the importance of understanding the intrinsic crystal structure, such as channel pathways, in controlling ionic defects and customizing electrical properties for applications.
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