Review of Industrialization Development of Nanoimprint Lithography Technology

This article summarizes the current development status of nanoimprint lithography (NIL) technology and its application prospects in multiple industries. Nanoimprint lithography technology has significant advantages, such as low cost, high resolution, and no development, and is not affected by standing wave effects, making it a potential technology in industries such as semiconductors, photovoltaics, and LEDs. However, nanoimprint lithography technology still faces challenges in terms of film characteristics and material selection during application. This article analyzes existing research and discusses its application advantages in the fields of patterned sapphire substrates (PSSs), Light-Emitting Diode (LED) chips, photovoltaic cells, etc., and proposes the role of technological progress in promoting industrialization. This article summarizes the opportunities and challenges of nanoimprint lithography technology in the future industrialization process and anticipates its development prospects for large-scale production.