氢氧化钾
硫酸
介电谱
王水
无机化学
循环伏安法
电化学
线性扫描伏安法
氢氧化物
过氧化氢
金氰化
化学
电极
金属
有机化学
物理化学
氰化物
作者
Lee MacKenzie Fischer,Maria Tenje,Arto Heiskanen,Noriyuki Masuda,Jaime Castillo,Anders Bentien,Jenny Emnéus,Mogens Jakobsen,Anja Boisen
标识
DOI:10.1016/j.mee.2008.11.045
摘要
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65^oC; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.
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