材料科学
纳米压痕
钒
摩擦学
微观结构
X射线光电子能谱
薄膜
摩擦学
溅射沉积
复合数
化学成分
摩擦系数
复合材料
溅射
分析化学(期刊)
冶金
化学工程
纳米技术
化学
有机化学
色谱法
工程类
作者
Lihua Yu,Bingyang Ma,Jun Cao,XU Jun-hua
出处
期刊:Chinese Physics
[Science Press]
日期:2013-01-01
卷期号:62 (7): 076202-076202
被引量:2
标识
DOI:10.7498/aps.62.076202
摘要
(Zr,V)N thin films with different V contents were deposited by reactive unbalanced magnetron sputtering. Their chemical composition, microstructure, mechanical and tribological properties were investigated by EDS, XRD, XPS, nanoindentation and tribometer. The results indicated that the fcc crystal structure of ZrN has not been changed by adding vanadium added, but the preferential orientation of films change from (200) to (111). As the V contents increased, the hardness of (Zr,V)N thin films decreased slowly after increased slightly, and decreased rapidly when V contents increased over 25.8 at.%. With increasing V contents, the coefficient of friction of (Zr,V)N thin films decreased slightly. The V2O3 was firstly found in the film of (Zr,V)N at 300 ℃ and when the temperature was increased over 500 ℃, the presence of V2O5 was found. Moreover, with the increase of the temperature the content of V2O5 increased, and the coefficient of friction of films decreased with the formation of V2O5.
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