材料科学
光电子学
多晶硅耗尽效应
图层(电子)
氮化硅
硅
表面粗糙度
基质(水族馆)
薄板电阻
电导
无线电频率
铝
电气工程
复合材料
电压
晶体管
数学
工程类
地质学
组合数学
海洋学
栅氧化层
作者
Tian Xu,Yali Zou,Xuan Huang,Junmin Wu,Shihao Wu,Yuhao Liu,Xuankai Xu,Fengyu Liu
出处
期刊:Micromachines
[MDPI AG]
日期:2023-02-28
卷期号:14 (3): 583-583
被引量:6
摘要
When AlN thin films are deposited directly on the high-resistance silicon (HR-Si) substrate, a conductive layer will be formed on the HR-Si surface. This phenomenon is called the parasitic surface conduction (PSC) effect. The presence of the PSC effect will increase the power consumption of electronic components. Therefore, it is necessary to reduce the PSC effect. In prior technology, the polysilicon layer is usually used as the trap-rich layer to reduce the PSC effect. Experiments show that compared to AlN films deposited directly on HR-Si, the AlN substrates with polysilicon introduced on HR-Si have less radio frequency (RF) loss. To verify the effect of polysilicon on RF loss, polysilicon films of three different thicknesses and several different roughnesses were introduced. The results show that the thickness of the polysilicon will affect the RF loss, while the roughness has almost no effect on it. The polysilicon trap-rich layer can reduce the RF loss, which gradually becomes smaller as the polysilicon thickness increases.
科研通智能强力驱动
Strongly Powered by AbleSci AI