铌酸锂
制作
栅栏
材料科学
光电子学
带宽(计算)
氮化硅
薄膜
硅
光学
计算机科学
纳米技术
电信
物理
替代医学
病理
医学
作者
Priyank Sain,T. Srinivas,Gopalkrishna Hegde
标识
DOI:10.1364/bgppm.2022.jw3a.16
摘要
An alternate way of designing a grating coupler on X cut thin film LNOI-Si 3 N 4 based platform is proposed considering the contamination and fabrication issues in CMOS fabrication facility. The coupling efficiency of 44% at 1550nm and 3dB bandwidth of 45nm is obtained for X cut Y propagation Lithium Niobate.
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