材料科学
单斜晶系
外延
薄膜
带隙
价(化学)
波段图
光电子学
结晶学
四方晶系
分析化学(期刊)
晶体结构
图层(电子)
物理
纳米技术
化学
量子力学
色谱法
作者
Giovanni Drera,Alessio Giampietri,Alfredo Febbrari,M. Patrini,Maria Cristina Mozzati,L. Sangaletti
出处
期刊:Physical review
[American Physical Society]
日期:2019-02-11
卷期号:99 (7)
被引量:11
标识
DOI:10.1103/physrevb.99.075124
摘要
In this work we analyze the electronic structure at the junction between a ${\mathrm{SrTiO}}_{3}$ (001) single crystal and a thin tetragonal CuO layer, grown by off-axis rf sputtering. A detailed characterization of the film growth, based on atomic force microscopy and x-ray photoelectron diffraction measurements, demonstrates the epitaxial growth. We report several markers of a thickness-dependent modification of the film gap, found on both Cu $2p$ and valence band spectra; through spectroscopic ellipsometry analysis, we provide direct proof of a band gap increase in the tetragonal CuO layer (1.57 eV) with respect to the thicker monoclinic CuO layer (1.35 eV). This phenomenon is further discussed in light of cluster calculations and density functional theory $+U$ simulations. Finally, we report the full experimental band junction diagram, showing a staggered configuration suitable for charge-separation applications, such as photovoltaics and photocatalysis; this configuration is observed up to very low ($<3$ nm) film thickness due to the gap broadening effect.
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