聚二甲基硅氧烷
光刻
超材料
材料科学
纳米技术
光电子学
作者
Ten Sekiguchi,Hidetaka Ueno,Vivek Anand Menon,Ryo Ichige,Yuya Tanaka,Hiroshi Toshiyoshi,Takaaki Suzuki
摘要
Polymers are increasingly being used as flexible structural materials in MEMS.We have focused on UV-cured polydimethylsiloxane (UV-PDMS), which is both photoreactive and highly flexible.In this study, we propose a photolithography-based patterning method to enable the microfabrication of UV-PDMS.The processing conditions related to patterning accuracy were also investigated.Furthermore, as a demonstration of the practical advantages of this processing method, free-standing flexible metamaterials with a negative Poisson's ratio were fabricated and uniaxial tensile tests were performed.The results showed a minimum Poisson's ratio of -1.30.Compared with the same type of specimen fabricated with a common permanent structural photoresist, the UV-PDMS specimen exhibited deformation approximately 12 times larger.
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