衍射仪
材料科学
溅射沉积
掺杂剂
分析化学(期刊)
退火(玻璃)
薄膜
兴奋剂
透射率
腔磁控管
溅射
红外线的
扫描电子显微镜
光电子学
光学
纳米技术
化学
冶金
复合材料
物理
色谱法
作者
Shuang Chen,Cui Zhi Dong,Li Fang Zhang,Zhi Ming Yu
出处
期刊:Advanced Materials Research
[Trans Tech Publications]
日期:2012-06-14
卷期号:538-541: 101-104
标识
DOI:10.4028/www.scientific.net/amr.538-541.101
摘要
W-doped VO 2 thin films were prepared by magnetron sputtering after annealing in vacuum. The structure, morphology, infrared transmittance and phase transition were characterized by X-ray diffractometer, atomic force microscopy(AFM), infrared spectrometer (IR) and differential thermal analysis(DTA), respectively. The results show that after vacuum annealing at 500 °C for 2h, the major phase of W doped films is VO 2 . Dopant reduce the phase transition temperature of VO 2 thin films to 21.9°C.
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