卤化物
碱金属
载流子
掺杂剂
晶体缺陷
化学物理
材料科学
钙钛矿(结构)
无机化学
带隙
化学
兴奋剂
结晶学
光电子学
有机化学
作者
Lu Qiao,Wei‐Hai Fang,Run Long,Oleg V. Prezhdo
标识
DOI:10.1002/ange.201911615
摘要
Abstract Defects, such as halide interstitials, act as charge recombination centers, induce degradation of halide perovskites, and create major obstacles to applications of these materials. Alkali metal dopants greatly improve perovskite performance. Using ab initio nonadiabatic molecular dynamics, it is demonstrated that alkalis bring favorable effects. The formation energy of halide interstitials increases by up to a factor of four in the presence of alkali dopants, and therefore, defect concentration decreases. When defects are present, alkali metals strongly bind to them. Halide interstitials introduce mid‐gap states that rapidly trap charge carriers. Alkalis eliminate the trap states, helping to maintain high current density. Further to charge trapping, the interstitials accelerate charge recombination. By passivating the interstitials, alkalis make carrier lifetimes up to seven times longer than in defect‐free perovskites and up to thirty times longer than in defective perovskites.
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