材料科学
阴极
纳米孔
溅射
立方氧化锆
多孔性
电解质
氧化物
极化(电化学)
阳极氧化
固体氧化物燃料电池
溅射沉积
化学工程
氧化钇稳定氧化锆
电化学
三相边界
阳极
沉积(地质)
薄膜
光电子学
功率密度
复合材料
纳米技术
气体扩散
X射线光电子能谱
脉冲激光沉积
物理气相沉积
表面扩散
电极
作者
J. Hwang,Yangjae Kim,Seungjae Lee,Nguyen Minh,Sanghoon Lee,Gu Young Cho,Suk Won Cha
出处
期刊:Small
[Wiley]
日期:2026-02-03
卷期号:22 (19): e09753-e09753
被引量:1
标识
DOI:10.1002/smll.202509753
摘要
ABSTRACT This paper reports an effective approach we have developed to sputter nanoporous single‐phase La 0 . 6 Sr 0 . 4 Co 0 . 2 Fe 0 . 8 O 3 ‐ δ (LSCF) thin‐film cathodes using glancing angle deposition (GLAD), which leverages the self‐shadowing effect to engineer nanocolumnar architectures with high porosity. By systematically tuning the sputtering pressure and film thickness, we achieved precise control over the cathode morphology, resulting in tunable porosity and triple‐phase boundary (TPB) density. The GLAD‐fabricated LSCF cathode deposited at 0.40 Pa exhibited a nanocolumnar porosity of 21.5%, compared to 7.5% for a conventionally sputtered LSCF film. At a thickness of 240 nm, this cathode achieved a polarization resistance of 6.4 Ω cm 2 at 500 °C, in contrast to 32.9 Ω cm 2 for its conventionally sputtered counterpart. Electrochemical analysis attributed this improvement to enhanced gas diffusion and surface exchange properties enabled by the nanocolumnar architecture. An anodized aluminum oxide (AAO)‐supported thin‐film SOFC (TF‐SOFC) integrating the optimized GLAD‐fabricated LSCF cathode (with yttria‐stabilized zirconia (YSZ) electrolyte and nickel‐yttrium doped ceria (YDC) anode) delivered a peak power density of 836 mW cm − 2 at 550 °C. These results establish GLAD sputtering as a promising strategy for engineering high‐performance, nanoporous single‐phase cathodes in LT‐SOFC systems.
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