Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces

Plasma processes are widely used for the deposition of thin films and/or the functionalization of material surfaces and interfaces ranging from inorganic to organic structures. The characterization of such plasma‐modified surfaces is challenging and most efficiently performed by optical methods, such as FTIR‐spectroscopy and related techniques. The present review aims at bridging the gap between optical spectroscopy fundamentals and the application of such experimental techniques in plasma surface science and engineering. The first part of the review covers the most relevant theoretical aspects of different reflection FTIR‐spectroscopy approaches; the second part presents the different applications of these principles for the investigation of surface processes induced by plasma. The applications take into account interaction of plasma with metal surfaces, semiconductors, and polymeric materials.