材料科学
记忆电阻器
氮化物
光电子学
超短脉冲
热传导
切换时间
能量(信号处理)
频道(广播)
图层(电子)
纳米技术
电子工程
复合材料
电气工程
光学
工程类
物理
统计
激光器
数学
作者
Byung Joon Choi,Antonio C. Torrezan,John Paul Strachan,Paul G. Kotula,Andrew J. Lohn,Matthew J. Marinella,Zhiyong Li,Richard Stanley Williams,J. Joshua Yang
标识
DOI:10.1002/adfm.201600680
摘要
High‐performance memristors based on AlN films have been demonstrated, which exhibit ultrafast ON/OFF switching times (≈85 ps for microdevices with waveguide) and relatively low switching current (≈15 μA for 50 nm devices). Physical characterizations are carried out to understand the device switching mechanism, and rationalize speed and energy performance. The formation of an Al‐rich conduction channel through the AlN layer is revealed. The motion of positively charged nitrogen vacancies is likely responsible for the observed switching.
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