熔点
兴奋剂
扩散
从头算
材料科学
拓扑(电路)
分析化学(期刊)
物理
光电子学
电气工程
化学
热力学
工程类
量子力学
色谱法
作者
Yosuke Matsushima,Takeshi Iwasaki,T. Daibou,Takayuki Sasaki,Yutaro Shimoda,Qi Zhu,Masakazu Goto,Yuya Sato,Makoto Onizaki,M. Nagamine,Minoru Amano,Hiroki Kawai,Hiroki Tokuhira,Kenta Chokawa,Rina Takashima,Takayuki Tsukagoshi,Masumi Saitoh,Keiji Ikeda,Katsuyoshi Komatsu
标识
DOI:10.1109/edtm58488.2024.10511529
摘要
We demonstrate ultra-high endurance selector with excellent scalability toward high-performance cross-point storage class memory (SCM). By employing stable oxide doped with high melting-point $\left(T_{\mathrm{m}}\right)$ compound as a selector, atomic diffusion during cycling is strongly suppressed even for small cell (sub-30nm$\phi$) and high drive current, which is confirmed by thermal TCAD and ab initio calculations. The fabricated sub-30nm$\phi$ pillar As-Se free selector achieves 10 12 cycles, low half-selected current (~4nA) and high drive current density (~15MA/cm 2 ).
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