量子位元
碳化硅
材料科学
量子
工程物理
纳米技术
物理
量子力学
冶金
出处
期刊:Applied sciences
[Multidisciplinary Digital Publishing Institute]
日期:2025-05-16
卷期号:15 (10): 5606-5606
被引量:4
摘要
This review provides an overview of defects in silicon carbide (SiC) with potential applications as quantum qubits. It begins with a brief introduction to quantum qubits and existing qubit platforms, outlining the essential criteria a defect must meet to function as a viable qubit. The focus then shifts to the most promising defects in SiC, notably the silicon vacancy (VSi) and divacancy (VC-VSi). A key challenge in utilizing these defects for quantum applications is their precise and controllable creation. Various fabrication techniques, including irradiation, ion implantation, femtosecond laser processing, and focused ion beam methods, have been explored to create these defects. Designed as a beginner-friendly resource, this review aims to support early-career experimental researchers entering the field of SiC-related quantum qubits. Providing an introduction to defect-based qubits in SiC offers valuable insights into fabrication strategies, recent progress, and the challenges that lie ahead.
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