碳化硅
材料科学
沟槽
光电子学
肖特基二极管
工程物理
二极管
电气工程
功率MOSFET
MOSFET
肖特基势垒
电压
纳米技术
工程类
复合材料
晶体管
图层(电子)
作者
Ryota Nakamura,Yuki Nakano,Masatoshi Aketa,Noriaki Kawamoto,Kazuhide Ino
出处
期刊:PCIM Europe 2014; International Exhibition and Conference for Power Electronics, Intelligent Motion, Renewable Energy and Energy Management; Proceedings of
日期:2014-05-20
卷期号:: 1-7
被引量:9
摘要
The expectations for Silicon Carbide (SiC) devices in advanced power electronics applications for saving energy continue to grow. This paper presents the ROHM 3rd generation, 1200V, 4H-SiC MOSFETs and 1200V 4H-SiC ultralow forward voltage drop (VF) Schottky barrier diodes (SBDs) with trench structure. Firstly, SiC trench MOSFETs, of which mass production is in preparation to start in 2014, exhibits half of the on-resistance (Ron) of the same size, 1200 V, ROHM SiC planar MOSFETs. Secondly, the developed SiC SBDs successfully showed about 0.3V lower VF than that of ROHM conventional 2G SBDs.
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