材料科学
金属
电气工程
拓扑(电路)
物理
分析化学(期刊)
化学
工程类
冶金
有机化学
作者
Yang Yin Chen,Ludovic Goux,Sergiu Clima,B. Govoreanu,R. Degraeve,Gouri Sankar Kar,A. Fantini,G. Groeseneken,Dirk J. Wouters,M. Jurczak
标识
DOI:10.1109/ted.2013.2241064
摘要
The endurance/retention performance of HfO 2 / Metal cap RRAM devices in a 1T1R configuration shows metal cap dependence. For Hf and Ti caps, owning strong thermodynamic ability of extracting oxygen from HfO 2 , long pulse endurance (>10 10 cycles) could be achieved. For Ta cap, owning lower thermodynamic ability of extracting oxygen from HfO 2 , better retention can be achieved. Therefore, an endurance/retention performance tradeoff is identified on the 40 nm × 40 nm HfO 2 /Metal cap bipolar RRAM devices. The tradeoff of endurance/retention performance can be explained by a different filament constriction shape depending on metal cap layer as derived from fitting I - V curves in the quantum point contact model. This difference in filament constriction shape is attributed to the thermodynamics difference of metal cap: Hf and Ti have a stronger thermodynamical ability to extract oxygen from HfO 2 than Ta. The possibility of tuning the intrinsic reliability performance by changing the cap materials paves a way for optimizing the operation of RRAM devices into the desired specifics.
科研通智能强力驱动
Strongly Powered by AbleSci AI