数字微镜装置
激光器
材料科学
数字光处理
激光扫描
扫描仪
空间光调制器
波长
炸薯条
固态
图像分辨率
光学
刷新率
光电子学
计算机科学
计算机硬件
工程类
纳米技术
物理
电信
投影机
工程物理
作者
Yoji Watanabe,Hirotaka Kono,Yuho Kanaya,Yûsuke Saito,Toshiaki Sakamoto,Soichi Owa,Noriyuki Hirayanagi,Thomas Myeongseok Koo,C. Poppe,D. Y. Tseng,Conrad Sorensen,Hwan Lee,Stephen P. Renwick,Bausan Yuan
摘要
Digital Scanner (DS), a DUV optical maskless exposure tool is being developed. It uses a micromirror-type spatial light modulator (SLM) to create the “mask” pattern combined with a solid state laser with wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application such as large area printing and chip ID printing for security purposes are shown.
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