干涉光刻
平版印刷术
光学
材料科学
下一代光刻
X射线光刻
干扰(通信)
棱镜
波长
模版印刷
电子束光刻
无光罩微影
表面等离子体子
光刻
等离子体子
梁(结构)
制作
光电子学
抵抗
纳米技术
物理
图层(电子)
电信
医学
频道(广播)
替代医学
病理
计算机科学
作者
Xiangxian Wang,Tianxu Jia,Yaqian Ren,Yingwen Su,Zhenyu Chen,Yunping Qi,Xiaolei Wen
出处
期刊:EPL
[Institute of Physics]
日期:2021-10-06
卷期号:136 (3): 34002-34002
被引量:4
标识
DOI:10.1209/0295-5075/ac2cf9
摘要
Abstract In this study, multi-beam surface plasmon (SP) interference lithography was theoretically proposed and demonstrated to fabricate periodic two-dimensional sub-wavelength structures. The lithography structures were based on an attenuated total reflection prism used to excite the SPs using a 442 nm laser. Circular lattices with periods of 166 and 288 nm were successfully obtained via three- and six-beam SP interference lithography, respectively; these lattices exhibited an identical feature size of 96 nm. Square dot arrays with a 177 nm period and 88.5 nm spot size were obtained by four-beam SP interference lithography. The proposed lithography technology has a simple structure and is economical; further, it may provide an effective method for the fabrication of two-dimensional sub-wavelength structures.
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