非阻塞I/O
结晶度
溅射
溅射沉积
基质(水族馆)
材料科学
分析化学(期刊)
氧气
薄膜
沉积(地质)
氧化物
化学工程
化学
纳米技术
冶金
复合材料
海洋学
生物
地质学
工程类
古生物学
催化作用
有机化学
生物化学
色谱法
沉积物
作者
Wei Xu,Xin Mao,Nan Zhou,Qingyu Zhang,Bo Peng,Yu Shen
出处
期刊:Vacuum
[Elsevier]
日期:2022-02-01
卷期号:196: 110785-110785
被引量:2
标识
DOI:10.1016/j.vacuum.2021.110785
摘要
Reactive sputtering deposition has been widely applied to the preparation of oxide films, but a method is still needed to stably control the deposition process and the film growth. In this work, the plasma in the vicinity of sputtering target is studied by optical emission spectroscopy and the atomic oxygen density ([O]) is linked to the sputtering mode and the growth of NiO films. The NiO films can be deposited either in oxide mode or in the transition region, whereas the [O] value plays an important role in determining the growth behavior of NiO films and the crystallinity. In the transition region, the (111)-oriented growth of NiO films is preferential and the crytallinity is improved with the decrease in the [O] value. In the oxide mode, the NiO films are preferentially (001)-oriented and exhibit a relatively good crystallinity. By fixing the O2/Ar flow ratio at a constant, the [O] value is explored as a function of substrate temperature, showing that the oxygen desorption may have significant impacts on the [O] value as the substrate temperature is higher than 400 °C.
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