外延
范德瓦尔斯力
材料科学
薄膜
无定形固体
蓝宝石
透射电子显微镜
图层(电子)
基质(水族馆)
光电子学
纳米技术
结晶学
化学
光学
分子
海洋学
物理
地质学
有机化学
激光器
作者
Eli Yablonovitch,D. M. Hwang,T.J. Gmitter,L. T. Florez,J. P. Harbison
摘要
Epitaxial liftoff is an alternative to lattice-mismatched heteroepitaxial growth. Multilayer AlxGa1−xAs epitaxial films are separated from their growth substrates by undercutting an AlAs release layer in HF acid (selectivity ≳108 for x≤0.4). The resulting AlxGa1−xAs films tend to bond by natural intermolecular surface forces to any smooth substrate (Van der Waals bonding). We have demonstrated GaAs thin-film bonding by surface tension forces onto Si, glass, sapphire, LiNbO3, InP, and diamond substrates, as well as self-bonding onto GaAs substrates. In transmission electron microscopy the substrate and thin-film atomic lattices can be simultaneously imaged, showing only a thin (20–100 Å) amorphous layer in between.
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