中间层
材料科学
微电子机械系统
微尺度化学
薄脆饼
制作
电镀
焊接
光电子学
晶圆级封装
机械工程
纳米技术
复合材料
蚀刻(微加工)
图层(电子)
病理
数学教育
工程类
医学
替代医学
数学
作者
Miku J. Laakso,Simon J. Bleiker,Jessica Liljeholm,Gustaf Mårtensson,Mikhail Asiatici,Andreas Fischer,Göran Stemme,Thorbjörn Ebefors,Frank Niklaus
出处
期刊:IEEE Access
[Institute of Electrical and Electronics Engineers]
日期:2018-01-01
卷期号:6: 44306-44317
被引量:28
标识
DOI:10.1109/access.2018.2861886
摘要
A through-glass via (TGV) provides a vertical electrical connection through a glass substrate. TGVs are used in advanced packaging solutions, such as glass interposers and wafer-level packaging of microelectromechanical systems (MEMS). However, TGVs are challenging to realize because via holes in glass typically do not have a sufficiently high-quality sidewall profile for super-conformal electroplating of metal into the via holes. To overcome this problem, we demonstrate here that the via holes can instead be filled by magnetically assembling metal wires into them. This method was used to produce TGVs with a typical resistance of 64 mΩ, which is comparable with other metal TGV types reported in the literature. In contrast to many TGV designs with a hollow center, the proposed TGVs can be more area efficient by allowing solder bump placement directly on top of the TGVs, which was demonstrated here using solder-paste jetting. The magnetic assembly process can be parallelized using an assembly robot, which was found to provide an opportunity for increased wafer-scale assembly speed. The aforementioned qualities of the magnetically assembled TGVs allow the realization of glass interposers and MEMS packages in different thicknesses without the drawbacks associated with the current TGV fabrication methods.
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