期刊:IEICE Transactions on Electronics [Institute of Electronics, Information and Communication Engineers] 日期:2017-01-01卷期号:E100.C (5): 486-489被引量:1
标识
DOI:10.1587/transele.e100.c.486
摘要
The Seebeck coefficient of Si wire co-doped with P and Ga atoms is investigated for applying thermoelectric devices. The observed Seebeck coefficient is closed to the theoretical values of electronic part of Seebeck coefficient due to the electronic transport. From the estimation of phonon scattering processes, it is found that the phonon-drag contribution to the Seebeck coefficient in co-doped Si wire is mainly governed by the phonon-boundary scattering.