Deposition of Diamondlike Carbon Films Using Electron Cyclotron Resonance Plasma Chemical Vapor Deposition from Ethylene Gas

Diamondlike carbon films have been prepared by RF bias electron cyclotron resonance (ECR) microwave plasma deposition from ethylene gas. The relationship between the properties of diamondlike carbon films and process parameters has been investigated. These films were evaluated in terms of Knoop hardness, Raman spectroscopy and hydrogen content measured by an elastic recoil detection analysis (ERDA) method. As the microwave power becomes higher, the hardness of the films tends to increase. This trend is different from that observed in the deposition of methane gas.