X射线光电子能谱
化学
电子结构
氩
溅射
氢
带隙
材料科学
分析化学(期刊)
化学计量学
物理化学
纳米技术
薄膜
计算化学
核磁共振
光电子学
物理
有机化学
色谱法
作者
A. Pfau,Klaus Schierbaum
出处
期刊:Surface Science
[Elsevier]
日期:1994-12-01
卷期号:321 (1-2): 71-80
被引量:675
标识
DOI:10.1016/0039-6028(94)90027-2
摘要
The influence of Ce3+-related defects on the electronic structure of stoichiometric CeO2 surfaces is studied by means of detection angle-dependent XPS, UPS and HREELS. Argon sputtering and hydrogen exposure at elevated temperatures lead to high concentrations of Ce3+ at surface and subsurface sites. The latter are identified by the binding energies of the Ce 3d core levels, additional emissions of C4f1-derived electronic states in the band gap, and characteristic changes in the electronic transitions from occupied into empty electronic states in the valence band region. UPS is found to show in particular a high sensitivity for intrinsic surface point defects, even if small concentrations are adjusted in the order of XPS and HREELS detection limits by high-temperature treatment of the CeO2 surfaces under UHV conditions or by hydrogen exposure at medium temperatures
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