非晶硅
光电导性
电导率
材料科学
退火(玻璃)
硅
无定形固体
氢
电阻率和电导率
化学物理
分析化学(期刊)
光电子学
化学
结晶学
晶体硅
复合材料
物理化学
有机化学
电气工程
工程类
色谱法
作者
D. L. Staebler,C. R. Wroński
摘要
Long exposure to light decreases the photoconductivity and dark conductivity of some samples of hydrogenated amorphous silicon (a-Si : H). Annealing above ∼150 °C reverses the process. The effect occurs in the bulk of the films, and is associated with changes in density or occupation of deep gap states. High concentrations of P, B, or As quench the effect. Possible models involving hydrogen bond reorientation at a localized defect or electron-charge transfer between defects are discussed. An example is shown where these conductivity changes do not affect the efficiency of an a-Si : H solar cell.
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