A Review on the Chemical Vapor Deposition Synthesis of 2D Materials and Their Applications

This chapter explains the principle and synthesis method involved in the chemical vapor deposition (CVD) process. A smart method for making layered 2D atomic crystal nanomaterials on a compatible substrate through bottom-up approach is explored. CVD is a vacuum deposition method used to produce high-quality, high-performance solid materials. CVD is a scalable method to fabricate one layer to multi-layer thin films to bulk layer hybrid materials and their hetero-structure composites by changing the precursor compound with combination of an appropriate element having affinity toward the precursor complex cations. The process stacks two or more atomic layers of different compounds in the rich variety of 2D library to explore novel and collective quantum phenomena at the interfaces. Recently, 2D-SnXSY semiconductor materials have been synthesized by using CVD. These hybrid materials find various applications in sensors, photovoltaics, and quantum phenomena. Latest trends on fabricating hetero-structures of SnS and SnS2 with other hybrid composites by CVD have also been discussed.