LiNi0.5Mn1.5O4 Thin Films Grown by Magnetron Sputtering under Inert Gas Flow Mixtures as High‐Voltage Cathode Materials for Lithium‐Ion Batteries

Abstract Delivering a commercial high‐voltage spinel LiNi 0.5 Mn 1.5 O 4 (LNMO) cathode electrode for Li‐ion batteries would result in a significant step forward in terms of energy density. However, the structural ordering of the spinel and particle size have considerable effects on the cathode material's cyclability and rate capability, which are crucial challenges to address. Here, a novel mid‐frequency alternating current dual magnetron sputtering method was presented, using different Ar‐N 2 gas mixtures ratios for the process gas to prepare various LNMO thin films with highly controlled morphology and particle size; as determined from X‐ray diffraction, Raman spectroscopy and electron microscopy. It resulted in enhanced cycling and rate performance. This processing method delivered N‐containing LNMO thin film electrodes with up to 15 % increased discharge capacity at 1 C (120 mAh g −1 ) with respect to standard LNMO (grown under only Ar gas flow) thin film electrodes, along with outstanding rate performance up to 10 C (99 mAh g −1 ) in the operating voltage window 3.5–4.85 V vs . Li + /Li. Besides, electrochemical impedance spectroscopy results showed that the intricate phase transitions present in standard LNMO electrodes were almost suppressed in N‐containing LNMO thin films grown under different Ar‐N 2 gas flow mixtures.