High‐Throughput Sub‐Diffraction‐Limited Two‐Photon Polymerization Direct Laser Writing via 10‐Channels Parallel Peripheral Photoinhibition

ABSTRACT Two‐photon polymerization direct laser writing (TPP‐DLW) enables fully 3D nanofabrication and offers clear advantages over conventional lithography for optical elements, biomedical devices, and advanced functional materials. Nonetheless, fabrication accuracy and throughput remain key bottlenecks. In light of these challenges, this work presents a 10‐channels parallel peripheral photoinhibition direct laser writing technique, dubbed ‐DLW, for sub‐diffraction‐limited 3D nanoprinting that simultaneously narrows feature size and improves throughput compared with traditional DLW. By employing a 3D hollow focus in conjunction with peripheral photoinhibition (PPI) technique, the feature size of the fabricated suspended nanowire is reduced from nm to nm. Leveraging fast and parallel scanning, the ‐DLW system achieves a maximum printing speed on the order of voxels per second in experiments, while maintaining high accuracy, throughput, and design flexibility. This work establishes a scalable platform for high‐precision, high‐throughput, and 3D nanoprinting and offers a viable pathway to advance functional device fabrication in photonic systems, biomedical interfaces, and engineered metamaterials.