锭
铟
砷化铟
材料科学
电子迁移率
杂质
砷化镓
载流子寿命
光电导性
霍尔效应
缓慢冷却
电阻率和电导率
砷化物
载流子
凝聚态物理
分析化学(期刊)
化学
硅
光电子学
复合材料
合金
电气工程
有机化学
工程类
物理
色谱法
作者
Jack R. Dixon,Dorothy P. Enright
摘要
Large reversible variations in carrier concentration, Hall mobility, and carrier lifetime have been produced in indium arsenide by heat treatment. For material cut from the parent ingot, carrier lifetimes measured by the photoelectromagnetic-photoconductive ratio method increase by a factor of over 20 as a result of slow cooling from 850°C. Heat treatment at temperatures of 450°C and above increases the carrier concentration of n-type material and decreases the carrier concentration of p-type material. Such variations are reversed by heat treatment at temperatures below 350°C. In this way, changes in the carrier concentration of over 1017 cm−3 have been produced, and InAs has been converted from p to n type. Various heat treatment mechanisms are examined. It is shown that the experimental results are consistent with the model proposed by Kurtz and Kulin involving the segregation and dispersion of donor impurities to and from dislocations.
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