兴奋剂
薄膜
拓扑绝缘体
凝聚态物理
量子霍尔效应
Dirac(视频压缩格式)
材料科学
霍尔效应
电子
拓扑(电路)
光电子学
纳米技术
物理
电阻率和电导率
量子力学
电气工程
工程类
中微子
作者
Jisoo Moon,Nikesh Koirala,M. Salehi,Wenhan Zhang,Weida Wu,Seongshik Oh
出处
期刊:Nano Letters
[American Chemical Society]
日期:2018-01-09
卷期号:18 (2): 820-826
被引量:35
标识
DOI:10.1021/acs.nanolett.7b04033
摘要
Bi2Se3, one of the most widely studied topological insulators (TIs), is naturally electron-doped due to n-type native defects. However, many years of efforts to achieve p-type Bi2Se3 thin films have failed so far. Here, we provide a solution to this long-standing problem, showing that the main culprit has been the high density of interfacial defects. By suppressing these defects through an interfacial engineering scheme, we have successfully implemented p-type Bi2Se3 thin films down to the thinnest topological regime. On this platform, we present the first tunable quantum Hall effect (QHE) study in Bi2Se3 thin films and reveal not only significantly asymmetric QHE signatures across the Dirac point but also the presence of competing anomalous states near the zeroth Landau level. The availability of doping tunable Bi2Se3 thin films will now make it possible to implement various topological quantum devices, previously inaccessible.
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