密度泛函理论
电子亲和性(数据页)
分解
离子键合
产量(工程)
计算化学
电子
电子束处理
阴极射线
电子密度
化学
光化学
物理
材料科学
离子
量子力学
有机化学
分子
冶金
作者
Kazumasa Okamoto,Takahiro Kozawa
标识
DOI:10.35848/1347-4065/abf469
摘要
Abstract The electron affinity (EA) of a photoacid generator (PAG) is an important parameter for estimating the acid generation efficiency in a chemically amplified resist upon exposure to ionizing radiation such as EUV light and an electron beam because the electron attachment of PAG induces PAG decomposition and acid generation. In this study, EAs of ionic and non-ionic PAGs were estimated by density functional theory calculations using static and dynamic models. The former model indicated that radical anions are produced without changing the PAG structure even after electron attachment. The latter model indicated that the product structures are relaxed to their stable structures after electron attachment (dissociative electron attachment). By demonstrating the relationship between the EA and acid yield, the most preferable model was revealed.
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