Organic Single Crystal Patterning Method for Micrometric Photosensors

Abstract Light detection technologies are of interest due to their applications in energy conversion and optical communications. Single‐crystal organic semiconductors, such as rubrene, present high detectivities and charge carrier mobility, making them attractive for light‐sensing applications. Growth of high crystallinity organic crystals is achieved using vapor processes, forming crystals of arbitrary shapes and orientations and requiring posterior patterning processes. However, patterning the organic semiconductors using industry‐standard microfabrication techniques is not straightforward, as these often cause irreversible damage to the crystals. Here the fabrication of patterned micrometric rubrene photosensors is demonstrated through a combination of photolithography and Reactive Ion Etching steps. Protective layers during microfabrication minimize degradation of optoelectronic properties of the organic single crystals during fabrication. Crystals undergoing the patterning process presented a survival rate of 39%. Photoresponse values of up to 41 mA W −1 are obtained under illumination at 500 nm. This opens a route for the industrial‐scale fabrication process of high‐performance optoelectronic devices based on organic crystals semiconductors.