Pseudo-source gated beta-gallium oxide MOSFET

This study demonstrates pseudo-source-gated beta-gallium oxide (β-Ga2O3) metal oxide semiconductor field effect transistors (MOSFETs). The proposed pseudo-source gated transistor (pseudo-SGT) architecture has a thin (∼11 nm) recessed channel design, effectively emulating conventional SGT characteristics without significantly compromising on-current. The fabricated devices exhibit remarkable intrinsic gain of 104, low output conductance of 10−8 S/mm, transconductance of 10−3 S/mm, and drain saturation voltage of ∼1.5 V, while maintaining a drain current of 1.3 mA/mm. These enhanced performance metrics significantly expand the potential of β-Ga2O3 MOSFETs for the development of Ga2O3 monolithic power integrated circuits.