Athermal Azobenzene-Based Nanoimprint Lithography

Advanced MaterialsVolume 28, Issue 13 p. 2624-2628 Communication Athermal Azobenzene-Based Nanoimprint Lithography Christian Probst, Christian Probst Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorChristoph Meichner, Christoph Meichner Institute of Physics and Bayreuth Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorKlaus Kreger, Klaus Kreger Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorLothar Kador, Lothar Kador Institute of Physics and Bayreuth Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorChristian Neuber, Corresponding Author Christian Neuber Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanyE-mail: christian.neuber@uni-bayreuth.de, hans-werner.schmidt@uni-bayreuth.deSearch for more papers by this authorHans-Werner Schmidt, Corresponding Author Hans-Werner Schmidt Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanyE-mail: christian.neuber@uni-bayreuth.de, hans-werner.schmidt@uni-bayreuth.deSearch for more papers by this author Christian Probst, Christian Probst Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorChristoph Meichner, Christoph Meichner Institute of Physics and Bayreuth Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorKlaus Kreger, Klaus Kreger Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorLothar Kador, Lothar Kador Institute of Physics and Bayreuth Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanySearch for more papers by this authorChristian Neuber, Corresponding Author Christian Neuber Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanyE-mail: christian.neuber@uni-bayreuth.de, hans-werner.schmidt@uni-bayreuth.deSearch for more papers by this authorHans-Werner Schmidt, Corresponding Author Hans-Werner Schmidt Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440 Bayreuth, GermanyE-mail: christian.neuber@uni-bayreuth.de, hans-werner.schmidt@uni-bayreuth.deSearch for more papers by this author First published: 28 January 2016 https://doi.org/10.1002/adma.201505552Citations: 42Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinkedInRedditWechat Graphical Abstract A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated. Citing Literature Supporting Information As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Filename Description adma201505552-sup-0001-S1.pdf641.4 KB Supplementary Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article. Volume28, Issue13April 6, 2016Pages 2624-2628 RelatedInformation