材料科学
蓝宝石
准分子激光器
通量
激光器
陶瓷
蚀刻(微加工)
光电子学
钛宝石激光器
光学
图层(电子)
复合材料
物理
作者
Hongtao Hu,Jingzhen Shao,Xi Wang,Xiaodong Fang
摘要
The 248 nm excimer laser etching characteristic of alumina ceramic and sapphire had been studied using different laser fluence and different number of pulses. And the interaction mechanism of 248 nm excimer laser with alumina ceramic and sapphire had been analyzed. The results showed that when the laser fluence was less than 8 J/cm2, the etching depth of alumina ceramic and sapphire were increased with the increase of laser fluence and number of pulses. At the high number pulses and high-energy, the surface of the sapphire had no obvious melting phenomenon, and the alumina ceramic appeared obvious melting phenomenon. The interaction mechanism of excimer laser with alumina ceramics and sapphire was mainly two-photon absorption. But because of the existence of impurities and defects, the coupling between the laser radiation and ceramic and sapphire was strong, and the thermal evaporation mechanism was also obvious.
科研通智能强力驱动
Strongly Powered by AbleSci AI