Laser lithography technique to fabricate integrated optical elements by ion exchange in glass

A simple, effective and low cost laser writing lithographic system is presented. This system with a simple optical design and interferometric control of the alignment is able to produce smallest optical features as 1 micrometers wide with high quality edges to produce prototypes of integrated optical elements by ion exchange in research laboratories. Results of several kinds of mask that can be generated for this systems as well as some of the integrated elements produced are shown.